The Michigan Nanofabrication Facility (MNF) provides facilities and technologies for research involving a variety of technologies and processes:
- III-V compound semiconductors for opto-electronics, and integrated photonics;
- Compound semiconductor processing for high-frequency microwave and millimeter-wave devices and circuits;
- Nanofabrication and research on materials for use in nanotechnology;
- 3µm double-poly single-metal p-well CMOS/BiCMOS
- All major micromachining and MEMS technologies, including:
- Bulk silicon micromachining,
- Surface micromachining,
- Electroplating,
- Wafer bonding,
- Electrodischarge machining,
- Post-process packaging, assembly, and testing
- Fine-line, e-beam, and nano imprint lithography.